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Title:
RADIATION-SENSITIVE COMPOSITION, INK COMPOSITION, INKJET RECORDING METHOD, PRINTED MATTER, METHOD FOR MANUFACTURING LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING PLATE
Document Type and Number:
Japanese Patent JP2007224229
Kind Code:
A
Abstract:

To provide a radiation-sensitive composition which highly sensitively reacts by the irradiation of an active radiation to thereby change its properties and is also excellent in thermal stability, and to provide an ink composition using the same, an inkjet recording method, printed matter, a lithographic printing plate, and a method for manufacturing the lithographic printing plate.

The radiation-sensitive composition comprises a compound composed of at least one anion containing a phosphorus atom, an antimony atom, or an arsenic atom, and at least one cation selected from the group consisting of an organometallic cation, and an iodine, phosphorus, carbon, nitrogen, or sulfur-centered organic onium cation. There is also provided an ink composition using the same, an inkjet recording method, printed matter, a lithographic printing plate, and a method for manufacturing the lithographic printing plate.

COPYRIGHT: (C)2007,JPO&INPIT


Inventors:
TSUCHIMURA TOMOTAKA
Application Number:
JP2006049626A
Publication Date:
September 06, 2007
Filing Date:
February 27, 2006
Export Citation:
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Assignee:
FUJIFILM CORP
International Classes:
C08G85/00; B41C1/10; B41J2/01; B41M5/00; C09D11/00; C09D11/322; C09D11/38; G03F7/004
Attorney, Agent or Firm:
Yasuhiro Noguchi