Title:
RELUCTANCE UNIT AND MANUFACTURING METHOD THEREOF
Document Type and Number:
Japanese Patent JPS55111184
Kind Code:
A
Abstract:
PURPOSE:To simplify a manufacturing process and raise the sensitivity of a reluctance unit, by coating a thin film of Ni, Co, Bi or the like to provide a magnetic material. CONSTITUTION:An SiO2 film 2 is produced on an si substrate 1. A thin film 3 of Ni, Co, Bi or their alloy is produced. Electrodes 4a, 4b and a protective film 5 are provided. When a magnetic field is applied to the assembly of these members, its crystallographic axis is shifted as the (111) plane is oriented in the direction of the magnetic field as to the thin film of Ni or the plane (001) plane is oriented in the direction of the magnetic field as to the thin film of Co. The electric resistance continuously varies depending on the change in the magnetic field. This results in providing a relutance unit of high sensitivity. When Ni or Co is used alone, the resistance decreases with the increase of the magnetic field.
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Inventors:
IMAOKA SUMIO
KAWASHIRO SANJI
SUZUKI SHINICHI
KAWASHIRO SANJI
SUZUKI SHINICHI
Application Number:
JP1887379A
Publication Date:
August 27, 1980
Filing Date:
February 20, 1979
Export Citation:
Assignee:
PIONEER ELECTRONIC CORP
International Classes:
H01L43/08; (IPC1-7): H01L43/08