To provide a resist composition which is excellent in storage stability and has good lithography properties, to provide a method for forming a resist pattern using the resist composition, and to provide a nitrogen-containing organic compound useful as a nitrogen-containing organic compound component contained in the resist composition.
The resist composition contains: a base material component (A) whose solubility to an alkali developing solution is changed by the action of an acid; an acid generator component (B) which generates an acid upon exposure; and a nitrogen-containing organic compound component (D) represented by general formula (d1). In the general formula (d1), R1 each independently represent hydrogen atom or straight chain, branched chain or cyclic alkyl group or aryl group which may have a substituent, R2 each independently represent hydrogen atom or 1-5C alkyl group.
UTSUMI YOSHIYUKI
SESHIMO TAKEHIRO
Masatake Shiga
Suzuki Mitsuyoshi
Mitsunaga Igarashi