SILICIC ACID BY THERMAL DECOMPOSITION, ITS PRODUCTION, FILLER COMPRISING SILICIC ACID, RHEOLOGICAL MODIFIER, CATALYST CARRIER, QUARTZ RAW MATERIAL, ELECTRONIC PART PACKING MATERIAL AND DISPERSION RAW MATERIAL

Title:

Document Type and Number:

Japanese Patent JP3234160

Kind Code:

B2

Abstract:

PROBLEM TO BE SOLVED: To obtain silicic acid by a thermal decomposition method, small in both specific surface area and DBP number and to provide a method for producing silicic acid.
SOLUTION: A silicon halide and/or an organosilicon halide is vaporized. The vapor is mixed with a carrier gas. The mixture is heated to a temperature clearly higher than the boiling point of the silicon halide compound, mixed with hydrogen and burned in a burner by a well-known method to give silicic acid by a thermal decomposition method having <90m2/g, advantageously <60m2/g specific surface area and <60wt.% (≉ dibutyl phthalate 57.30ml/100g) DBP absorption.

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Inventors:

Helmut Mangold
Dieter Kellner
Peter Kleinschmitt

Application Number:

JP21483096A

Publication Date:

December 04, 2001

Filing Date:

August 14, 1996

Export Citation:

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Assignee:

Degussa-Hüls Akchen Gesell Shaft

International Classes:

C01B33/12; B01J21/08; B01J37/08; C01B33/18; C08K3/36; C09D7/00; C09D7/12; C09G1/02; H01L23/29; (IPC1-7): C01B33/18; C01B33/12

Domestic Patent References:

JP59102810A
JP59184721A

Attorney, Agent or Firm:

Toshio Yano (2 outside)

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