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Title:
SOLAR CELL AND METHOD OF MANUFACTURING THE SAME
Document Type and Number:
Japanese Patent JP2014072222
Kind Code:
A
Abstract:

To provide a structure of a crystal silicon solar cell which can be manufactured using a lower cost manufacturing step and in which an electrode is formed on a surface opposite to a light-receiving surface of the crystal silicon substrate, and to provide a method of manufacturing the solar cell.

A solar cell comprises: a crystal silicon substrate composed of single crystal silicon or polycrystalline silicon; an insulating layer formed on a surface opposite to a light-receiving surface of the crystal silicon substrate, composed of polyimide, and including a plurality of openings or an insulating layer laminated with an insulating layer composed of an inorganic material or an insulating layer composed of polyimide and including a plurality of openings; and an electrode including the silicon substrate and a contact through the plurality of openings. This electrode is formed in the contact part and in a part or the whole of the insulating layer composed of polyimide by a plating method.


Inventors:
WIN MOSE
GOSHIMA TOSHIYUKI
SATO TAKAHIRO
TAKATO HIDETAKA
Application Number:
JP2012214809A
Publication Date:
April 21, 2014
Filing Date:
September 27, 2012
Export Citation:
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Assignee:
PI R & D CO LTD
NAT INST OF ADV IND & TECHNOL
International Classes:
H01L31/04; H01L31/06
Domestic Patent References:
JP2001189475A2001-07-10
JP2006183040A2006-07-13
JP2012038915A2012-02-23
JP2011168889A2011-09-01
JP2001189475A2001-07-10
JP2006183040A2006-07-13
JP2012038915A2012-02-23
Foreign References:
WO2011151898A12011-12-08
WO2011099555A12011-08-18
Other References:
JPN6016002947; 井狩 頌平ら: '酸素プラズマ処理を施したフレキシブルプリント配線板用ポリイミドの銅めっき密着性に関する研究' 材料 Vol.59,No.10, 20100918, p.705〜711
Attorney, Agent or Firm:
Eijiro Tanikawa