Title:
スパッタリングターゲット
Document Type and Number:
Japanese Patent JP6845069
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a sputtering target capable of forming a magnetic film capable of striking a balance between excellent magnetic separability between magnetic particles, and high coercivity; and to provide the magnetic film and a production method of the magnetic film.SOLUTION: A sputtering target contains, in terms of the atomic ratio, Zn as much as 1at.% or more, a part or all of which forms a complex oxide of Zn-Ti-O and/or Zn-Si-O, contains Pt as much as 45at.% or less, and has a residue containing Co and inevitable impurities.SELECTED DRAWING: None
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Inventors:
Aimi Masuda
Masayoshi Shimizu
Boarding akira
Masayoshi Shimizu
Boarding akira
Application Number:
JP2017072947A
Publication Date:
March 17, 2021
Filing Date:
March 31, 2017
Export Citation:
Assignee:
JX Nippon Mining & Metals Co., Ltd.
International Classes:
C23C14/34; B22F1/00; C22C1/05; C22C19/07; G11B5/64; G11B5/851
Domestic Patent References:
| JP2007004957A | ||||
| JP2003313659A |
Attorney, Agent or Firm:
Axis International Patent Business Corporation