Title:
SUBSTRATE PROCESSOR AND DEVELOPING DEVICE
Document Type and Number:
Japanese Patent JP3694641
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a substrate processor and developing device which can prevent generation of a water stain (residue) at the time of spin drying of a rinse solution after a substrate is developed.
SOLUTION: A developing device 38 in the substrate processor includes a stage 51 having a mount surface on which a substrate G is mounted, a rotary means for rotating the stage, a developing-solution supply means 56 for supplying a developing solution onto the substrate on the stage, a rinse-solution supply means 63 for supplying a rinse solution onto the substrate on the stage for clean the developing solution, and a blow gas supply means 62 for drying and removing the rinse solution remaining on the substrate by blowing a gas on the substrate on the stage. The blow gas supply means ejects the gas onto the substrate while moving from the central part of the substrate toward a peripheral part thereof. The rinse solution supplymeans supplies the rinse solution to the central part of the substrate and then, prior to the gas ejection from the blow gas supply means, supplies the rinse solution onto the substrate while moving from the central part of the substrate toward the peripheral part thereof.
Inventors:
Shunichi Yahiro
Taketora Shinoki
Taketora Shinoki
Application Number:
JP2000241595A
Publication Date:
September 14, 2005
Filing Date:
August 09, 2000
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
G02F1/13; G02F1/1333; G03F7/30; H01L21/027; H01L21/304; H01L21/306; (IPC1-7): H01L21/027; G02F1/13; G02F1/1333; G03F7/30; H01L21/304; H01L21/306
Domestic Patent References:
| JP10335298A | ||||
| JP64067917A | ||||
| JP7135137A | ||||
| JP5226242A | ||||
| JP5315240A | ||||
| JP9314019A | ||||
| JP1214863A |
Attorney, Agent or Firm:
Junichi Omori