To provide a measuring method capable of highly selectively detecting functional groups existing on the surfaces of various kinds of materials.
A compound containing elements not existing on a material surface is caused to react with the functional group of the material surface at a normal temperature at a vapor phase selectively, and the material surface after the reaction is elementary analyzed. As the element, hydrogen, especially fluorine or chlorine, is favorable, and as the compound one containing these elements in C1 up to C4 alkyl chains is favorable. An analyzing means is selected properly from ESCA, AES(Auger electron spectroscopy), XMA(X-ray microanalysis), SIMS(secondary ion mass spectrometry), etc., at need, and is combined with reaction.
HACHIKAWA RIYOUKO
WAKASA MASANOBU
WAKIZAKA TATSUJI
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