TETRAPHENOL COMPOUND, ITS PRODUCTION AND USE - Sumitomo Chemical Co., Ltd.

Title:

TETRAPHENOL COMPOUND, ITS PRODUCTION AND USE

Document Type and Number:

Japanese Patent JP3139319

Kind Code:

B2

Abstract:

PURPOSE: To obtain the subject new compound excellent in sensitivity, resolution and heat resistance and useful as a photosensitizer (precursor) for photosensitive resin compositions permitting good profiles, focuses, etc., and used for finely processing semiconductors.
CONSTITUTION: A compound of the formula (R1-R4 are H, 1,2-naphthoquinone diazido-4-sulfonyl, 2-naphthoquinonediazido-5-sulfonyl). For example, 4,4'- methylenebis [2-(2-hydroxy-5-methylbenzyl)-3,6-dimethylphenol]. The exampled compound is produced by reacting 4,4'-methylenebis(2-hydroxymethyl-3,6- dimethylphenol) with paracresol.

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Inventors:

Koji Ichikawa
Haruki Ozaki
Atsushi Tomioka

Application Number:

JP4821995A

Publication Date:

February 26, 2001

Filing Date:

March 08, 1995

Export Citation:

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Assignee:

Sumitomo Chemical Co., Ltd.

International Classes:

C07C37/11; C07C39/15; C07C303/28; C07C309/53; C07C309/76; C08F2/50; G03F7/022; (IPC1-7): C07C39/15; C07C37/11; C07C303/28; C07C309/76; G03F7/022

Attorney, Agent or Firm:

Takashi Kuboyama (1 person outside)

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