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Title:
THIN FILM MANUFACTURING METHOD AND THIN FILM MANUFACTURING APPARATUS
Document Type and Number:
Japanese Patent JP2013038169
Kind Code:
A
Abstract:

To provide a thin film manufacturing method and a thin film manufacturing apparatus capable of forming a thin film with uniform film composition in the substrate surface.

In the thin film manufacturing method, a film is deposited while maintaining the temperature on the periphery of a substrate (second temperature) higher than the temperature in the center of the substrate (first temperature). When such a temperature distribution is formed, steam pressure on the periphery of the substrate is higher than that in the center of the substrate, and thereby the amount of high steam pressure component that can be contained in the gas phase on the periphery of the substrate can be increased. Consequently, precipitation of gaseous species distributed with high concentration above the periphery of the substrate can be suppressed, and a thin film can be formed with uniform composition in the substrate surface.


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Inventors:
MASUDA TAKESHI
ODAJIMA NOBUHIRO
KAJINUMA MASAHIKO
IDENO TAKUYA
KATO NOBUYUKI
SU HIROTSUNA
Application Number:
JP2011171957A
Publication Date:
February 21, 2013
Filing Date:
August 05, 2011
Export Citation:
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Assignee:
ULVAC CORP
International Classes:
H01L21/316; C23C16/46; H01L21/31
Domestic Patent References:
JPH11176821A1999-07-02
JP2011018811A2011-01-27
JPH06163415A1994-06-10
JP2010258046A2010-11-11
JP2003324100A2003-11-14
JP2001023975A2001-01-26
JP2007327106A2007-12-20
JPH0689986A1994-03-29
Attorney, Agent or Firm:
Junichi Omori
Ori Akira



 
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