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Title:
PHOTOSENSITIVE LITHOGRAPHIC PLATE
Document Type and Number:
Japanese Patent JPS5942539
Kind Code:
A
Abstract:

PURPOSE: To obtain a photosensitive lithographic plate improved in development accelerating property, by forming a photosensitive layer contg. an org. and/or inorg. salt of a diazo resin, a polymer compd. soluble in org. solvents, and a specified compd. on a support.

CONSTITUTION: The photosensitive layer is formed on a support by coating and drying it with a coating soln. obtd. by dissolving or dispersing in an org. solvent, (A) 5W30wt% org. and/or inorg. salt of a diazo resin insoluble or difficultly soluble in water and soluble in org. solvents; (B) 70W95wt% polymer compd. soluble in org. solvents, such as epoxy resin; (C) 0.1W20wt% compd. having the formula as shown in which R is H, 1W2C alkyl, or aryl, and X+1, X+2 are each H, alkali, or alkaline earth metal, or amine; and when needed, 0.5W20wt% basic oil-soluble dye or 10W40wt% pigment.


Inventors:
NAKATSUKA MASAO
OOTA TAKATOSHI
EZAKA TERUO
Application Number:
JP15328382A
Publication Date:
March 09, 1984
Filing Date:
September 02, 1982
Export Citation:
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Assignee:
OKAMOTO KAGAKU KOGYO KK
International Classes:
G03F7/004; G03F7/00; G03F7/016; G03F7/021; (IPC1-7): G03C1/52; G03F7/08
Domestic Patent References:
JPS4945322A1974-04-30
Attorney, Agent or Firm:
Okuyama Nao



 
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