WASHING DEVICE FOR SEMICONDUCTOR WAFER

Japanese Patent JPS59134834

A

PURPOSE:To prevent foreign matters to be carried into a washing bath by a carrier and contrive to improve the working efficiency by a method wherein every washing bath is equipped with an exclusive receiver, and wafer carriage between baths is performed by a self-running carrier independent of those. CONSTITUTION:The carrier 3 whereon wafers 2 are placed by parallel upright is intermittently fed. When it stops momentarily immediately above a washing bath 5, a quartz receiver 6 rises, and then the wafers 2 are smoothly given and taken through the groove holes 3a of the carrier 3. The carrier 3 escapes from the bath 5, the receiver 6 falls down and stops at a fixed position, and then the wafers 2 is dipped in washing solution 4 and washed. In prescribed time, the receiver 6 rises and stops at a fixed position. The carrier 3 advances during this time, while the receiver 6 falls down and hands the wafers 2 to the carrier 3. This constitution enables to smoothly give and take the wafers without carrying foreign matters into the washing bath from the carrier, and accordingly the working efficiency is largely improved.

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SAKASHITA TAKESHI

JP896283A

August 02, 1984

January 21, 1983

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MITSUBISHI ELECTRIC CORP

H01L21/304; H01L21/00; (IPC1-7): H01L21/304

JPS5594044U	1980-06-30
JPS54159871A	1979-12-18
JPS56126930A	1981-10-05
JPS57128142U	1982-08-10
JPS5643718A	1981-04-22

Masuo Oiwa

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