Title:
真空蒸着装置及び温度調整方法
Document Type and Number:
Japanese Patent JP4468474
Kind Code:
B1
Abstract:
A vacuum deposition apparatus is provided with: a vacuum chamber (1) capable of storing a body (B) which is to have a material deposited thereon and is carried from the outside; a crucible (2) which is arranged inside the vacuum chamber (1) and stores the deposition material (M); a heating source (3) which heats the crucible (2) and vaporizes the deposition material (M); and a plurality of supporting sections (5), which are dispersedly arranged on a bottom section (2c) of the crucible (2), support the crucible (2) and transfer heat between the crucible (2) and a floor section (1a) of the vacuum chamber (1). Temperature distribution can be uniformized and excessive filling of the material can be reduced using the vacuum deposition apparatus.
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Inventors:
Tatsuya Hirano
Toshiro Kobayashi
Toshiro Kobayashi
Application Number:
JP2008327518A
Publication Date:
May 26, 2010
Filing Date:
December 24, 2008
Export Citation:
Assignee:
MITSUBISHI HEAVY INDUSTRIES,LTD.
International Classes:
C23C14/24; H01L51/50; H05B33/10
Domestic Patent References:
| JP2006348337A | ||||
| JP2008240015A | ||||
| JP2008208443A |
Attorney, Agent or Firm:
Ryuichiro Mori
Masatake Shiga
Tadashi Takahashi
Tetsuo Yamazaki
Masatake Shiga
Tadashi Takahashi
Tetsuo Yamazaki