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Patent Searching and Data


Title:
VAPOR DEPOSITION DEVICE
Document Type and Number:
Japanese Patent JPS63111169
Kind Code:
A
Abstract:

PURPOSE: To improve attaching operation and detaching operation of an evaporation source provided to the inside of the titled device by allowing both electroconductional connection and positioning fixation for a vacuum tank and a vapor deposition jig to be made independent respectively as an exclusive mechanism.

CONSTITUTION: This vapor deposition device is formed from a vacuum tank 27, a vapor deposition jig 100 capable of attaching and detaching a vapor deposition source 4 to/form the vacuum tank 27 in such a state that the vapor deposition source 4 is mounted on a bottom plate 18 and electrode terminal means, etc. These electrode terminal means consist of spring members 28 and stands provided parallel thereto and feed a plural electric power sources to the above- mentioned jig 100. The electric connection of the jig 100 and the vacuum tank 27 is performed with the spring members 28. Further the positioning of the jig and the vacuum tank 27 is performed by the stands.


Inventors:
SATO KIKUO
Application Number:
JP25564686A
Publication Date:
May 16, 1988
Filing Date:
October 29, 1986
Export Citation:
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Assignee:
HITACHI LTD
International Classes:
C23C14/24; (IPC1-7): C23C14/24
Attorney, Agent or Firm:
Katsuo Ogawa