Title:
WAVEFRONT MEASUREMENT INSTRUMENT, WAVEFRONT MEASUREMENT METHOD, METHOD OF MANUFACTURING OPTICAL ELEMENT, AND ASSEMBLY ADJUSTMENT DEVICE OF OPTICAL SYSTEM
Document Type and Number:
Japanese Patent JP2015055544
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a wavefront measurement instrument which is capable of wavefront measurement of an optical element having large wavefront aberrations, has high accuracy, and is low-cost.SOLUTION: The wavefront measurement instrument measures a transmitted wavefront or a reflected wavefront of an optical element and includes: measurement means which measures a light intensity distribution on the basis of a luminous flux transmitted through or reflected by the optical element; area determination means which determines a first area and a second area on the basis of a plurality of spot positions in the light intensity distribution; first signal processing means which calculates a first wavefront using a linear model on the basis of information relating to a light intensity distribution in the first area; and second signal processing means which estimates a second wavefront by repeating light propagation calculation with the first wavefront as an initial value on the basis of information relating to light intensity distributions in the first area and the second area.
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Inventors:
OKUBO AKINORI
YONEYA YUKI
YONEYA YUKI
Application Number:
JP2013188814A
Publication Date:
March 23, 2015
Filing Date:
September 11, 2013
Export Citation:
Assignee:
CANON KK
International Classes:
G01M11/02; G01J9/00; G01M11/00
Attorney, Agent or Firm:
Ryosuke Fujimoto
Atsuya Mizumoto
Michiya Hirayama
Atsuya Mizumoto
Michiya Hirayama