Title:
X-RAY EXPOSURE MASK
Document Type and Number:
Japanese Patent JPS61185929
Kind Code:
A
Abstract:
PURPOSE:To prevent the effect of an adjoining shot by a method wherein a material, which is transparent for a visible light and absorbs the X-rays to be used for exposure, is filled in the aperture region of the Si substrate whereon an alignment mark is formed. CONSTITUTION:In the structure diagram of a cross section, the X-ray absorbing pattern 21, which constitutes a transfer pattern, the mask pattern 25 consisting of an Si3N4 film to be used for selective removal by etching of the prescribed region of an alignment mark 22, an X-ray transmitting thin film 23, and an Si frame 24 using the anisotropic etchant such as a KO aqueous solution and the like, for example, and the organic material 26 which is filled to attenuate the X-rays to be made incident on the aperture region provided on the Si frame 24 of the region whereon the alignment mark 22 is formed, are indicated respectively. As a result, the superpositional exposure of the adjoining shots in a step-and-repeat X-ray exposure can be prevented, and the X-rays pass through the aperture part on the circumference of the alignment mark, thereby enabling to prevent the effect affecting on the adjoining shot region.
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Inventors:
SUZUKI KATSUMI
Application Number:
JP2548385A
Publication Date:
August 19, 1986
Filing Date:
February 13, 1985
Export Citation:
Assignee:
NEC CORP
International Classes:
G03F1/00; G03F1/38; H01L21/027; H01L21/30; (IPC1-7): G03F1/00
Attorney, Agent or Firm:
Uchihara Shin
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