Title:
X-RAY SOURCE
Document Type and Number:
Japanese Patent JP2012094531
Kind Code:
A
Abstract:
To provide an X-ray from a single-spot micro-focusing x-ray source having the advantages of long service life and durability associated with a rotating anode and high luminance needed for advanced x-ray applications.
Emitted electrons travel towards a target 30 in parallel with a longitudinal axis extending between an electron-generation chamber 12 and a target chamber 14, and bombard the target to generate x-rays. The target is displaceable, while being bombarded with electrons, with respect to a support structure in at least one direction perpendicular to the longitudinal axis.
Inventors:
BONGLEA KIM
Application Number:
JP2011279345A
Publication Date:
May 17, 2012
Filing Date:
December 21, 2011
Export Citation:
Assignee:
OSMIC INC
International Classes:
H01J35/28; H01J35/08; H01J35/14; H01J35/16; H01J35/24
Domestic Patent References:
| JP2000090862A | 2000-03-31 | |||
| JP2004055325A | 2004-02-19 |
Attorney, Agent or Firm:
Hideto Asamura
Hajime Asamura
Katsunori Shirae
Toru Mori
Hiroyuki Hashimoto
Koji obi
Hajime Asamura
Katsunori Shirae
Toru Mori
Hiroyuki Hashimoto
Koji obi
Previous Patent: ELASTIC CONTACT
Next Patent: CONDUCTIVE PARTICLE, ANISOTROPIC CONDUCTIVE MATERIAL, AND CONNECTION STRUCTURE
Next Patent: CONDUCTIVE PARTICLE, ANISOTROPIC CONDUCTIVE MATERIAL, AND CONNECTION STRUCTURE