Title:
A manufacturing method of p type diffusion-zone formation constituent and p type diffusion zone, and a manufacturing method of a solar cell element
Document Type and Number:
Japanese Patent JP5927793
Kind Code:
B2
Abstract:
The invention provides a composition for forming a p-type diffusion layer, the composition comprising boron nitride, a dispersion medium and an inorganic binder.
Inventors:
Akihiro Oda
Masato Yoshida
Tsuyoshi Nojiri
Youichi Machii
Mitsunori Iwamuro
Keiko Kizawa
Shuichiro Adachi
Tetsuya Sato
Masato Yoshida
Tsuyoshi Nojiri
Youichi Machii
Mitsunori Iwamuro
Keiko Kizawa
Shuichiro Adachi
Tetsuya Sato
Application Number:
JP2011157227A
Publication Date:
June 01, 2016
Filing Date:
July 15, 2011
Export Citation:
Assignee:
Hitachi Chemical Co., Ltd.
International Classes:
H01L21/225
Domestic Patent References:
| JP2003069056A | ||||
| JP2010157654A | ||||
| JP2007103664A |
Foreign References:
| WO2009116569A1 |
Attorney, Agent or Firm:
Patent Service Corporation Taiyo International Patent Office