Title:
MANUFACTURING METHOD OF VAPOR-DEPOSITED FILM
Document Type and Number:
Japanese Patent JP2016186106
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a method of reducing a risk of damaging to a film surface by suppressing an abnormal discharge such as an arc discharge, as well as improving adhesion between a substrate film and a vapor deposition layer in performing a plasma treatment on the substrate film.SOLUTION: A manufacturing method of a vapor deposition film forms a vapor deposition layer following a plasma treatment while a substrate film is made to continuously travel, the plasma treatment being a discharge type using a discharge electrode of a planer magnetron type. The discharge electrode consists of a metal material with a sputtering rate of 1.1 by an argon ion of 500 eV.SELECTED DRAWING: Figure 1
Inventors:
KOMORI TSUNENORI
Application Number:
JP2015066625A
Publication Date:
October 27, 2016
Filing Date:
March 27, 2015
Export Citation:
Assignee:
TORAY ADVANCED FILM CO LTD
International Classes:
C23C14/02; B65D65/40
Attorney, Agent or Firm:
Ichijo power
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