VAPOR DEPOSITION MASK, METHOD FOR MANUFACTURING VAPOR DEPOSITION MASK AND METHOD FOR MANUFACTURING ORGANIC SEMICONDUCTOR ELEMENT

Title:

VAPOR DEPOSITION MASK, METHOD FOR MANUFACTURING VAPOR DEPOSITION MASK AND METHOD FOR MANUFACTURING ORGANIC SEMICONDUCTOR ELEMENT

Document Type and Number:

Japanese Patent JP2017057494

Kind Code:

A

Abstract:

PROBLEM TO BE SOLVED: To provide a vapor deposition mask capable of suppressing deformation and improving vapor deposition quality.SOLUTION: A vapor deposition mask 20 has one surface 20a and the other surface 20b facing the one surface 20a and includes a plurality of open holes 25 and a partition parts 26 for partitioning each open hole 25. The partition part 26 has a first surface 26a forming a part of the one surface 20a of the vapor deposition mask 20 and a second surface 26b facing the first surface 26a and is curved so that the first surface 26a is convex toward the outer side of the partition part 26 on a cross section orthogonal to the extended direction of the partition part 26.SELECTED DRAWING: Figure 4

More Like This:

JP2022153547	MATERIAL FOR FORMING NUCLEATION INHIBITING COATING AND DEVICE INCORPORATING THE SAME
JP3465797	JIG FOR SPUTTERING
WO/2022/083209	REPAIRING METHOD FOR MASK PLATE

Inventors:

IKENAGA CHIKAO
TAKEDA TOSHIHIKO
HIROBE YOSHIKI
HATSUDA CHIAKI

Application Number:

JP2016157924A

Publication Date:

March 23, 2017

Filing Date:

August 10, 2016

Export Citation:

Click for automatic bibliography generation Help

Assignee:

DAINIPPON PRINTING CO LTD

International Classes:

C23C14/04; H01L51/50; H05B33/10

Domestic Patent References:

JP2004006371A	2004-01-08
JPH10298738A	1998-11-10
JP2005154879A	2005-06-16
JP2015067885A	2015-04-13

Attorney, Agent or Firm:

Hiroyuki Nagai
Yukitaka Nakamura
Yasukazu Sato
Satoru Asakura
Yukihiro Hotta
Yasumoto Yasumoto

Previous Patent: 撮像装置および画像処理装置

Next Patent: A vapor deposition mask, a vapor deposition mask manufacturing method, and an organic semiconductor ...