Title:
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2017181697
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition excellent in LWR performance, CDU performance, EL performance, and defect inhibition properties.SOLUTION: A radiation-sensitive resin composition comprises: a polymer having a structural unit including an acid-dissociable group; a radiation-sensitive acid generator; an acid diffusion inhibitor; and a solvent, wherein the acid diffusion inhibitor is a compound expressed by the following formula (1-1) or the following formula (1-2).SELECTED DRAWING: None
Inventors:
NAMAI HAYATO
Application Number:
JP2016066924A
Publication Date:
October 05, 2017
Filing Date:
March 29, 2016
Export Citation:
Assignee:
JSR CORP
International Classes:
G03F7/039; C08F22/10; C09K3/00; G03F7/004; G03F7/038; G03F7/20
Domestic Patent References:
| JP2012252124A | 2012-12-20 | |||
| JP2011107691A | 2011-06-02 |
Foreign References:
| WO2016158711A1 | 2016-10-06 |
Attorney, Agent or Firm:
Hajime Amano
Yoshinori Ikeda
Hiroshi Ogawa
Koji Ishida
Kazuki Kagami
Kenichi Fujinaka
Yoshinori Ikeda
Hiroshi Ogawa
Koji Ishida
Kazuki Kagami
Kenichi Fujinaka
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