A sulfonic acid derivative, a photo-oxide generating agent, photoresist material, and a manufacturing method of an electronic devide

Title:

A sulfonic acid derivative, a photo-oxide generating agent, photoresist material, and a manufacturing method of an electronic devide

Document Type and Number:

Japanese Patent JP5973020

Kind Code:

B2

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Inventors:

Yasuhiro Hosoi
Kaneko

Application Number:

JP2015043715A

Publication Date:

August 17, 2016

Filing Date:

March 05, 2015

Export Citation:

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Assignee:

Toyo Gosei Co., Ltd.

International Classes:

C07C309/12; C07C25/00; C07C381/12; C08K5/42; C09K3/00; G03F7/004; G03F7/039

Domestic Patent References:

JP2010256856A
JP2008007410A
JP2007304490A
JP2009258695A

Other References:

Mingxing Wang et al.,New Anionic Photoacid Generator Bound Polymer Resists for EUV Lithography,Macromolecules,2007年,40,8220-8224
Mingxing Wang et al.,Fluorine-contained photoacid generators (PAGs) and corresponding polymer resists,Journal of Fluorine Chemistry,2008年,129,607-612

Attorney, Agent or Firm:

Hiroyuki Kurihara

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