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Title:
SYSTEM FOR DETECTING OR REVIEWING DEFECT IN SEMICONDUCTOR SAMPLE
Document Type and Number:
Japanese Patent JP2022119894
Kind Code:
A
Abstract:
To provide a method and an apparatus for detecting or reviewing a defect in a semiconductor sample.SOLUTION: A system 200 has a bright field (BF) module, the BF module directs a BF illumination beam onto a sample 216 and detects an output beam which is reflected from the sample 216 in response to the BF illumination beam. The system 200 has a modulated optical reflectance (MOR) module, the MOR module directs a pump beam and a probe beam to the sample 216 and detects a MOR output beam from a probe spot in response to the pump beam and the probe beam. The system includes a control device 290 for analyzing the BF output beam from a plurality of BF spots to detect defects on a surface or near surface of the sample 216, and analyzing the MOR output beam from a plurality of probe spots to detect a defect present below the surface of the sample 216.SELECTED DRAWING: Figure 2

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Inventors:
LENA NICOLAIDES
MOHAN MAHADEVAN
ALEX SALNIK
SCOTT A YOUNG
Application Number:
JP2022085749A
Publication Date:
August 17, 2022
Filing Date:
May 26, 2022
Export Citation:
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Assignee:
KLA CORP
International Classes:
G01N21/956; G01N25/72
Domestic Patent References:
JPH0349296A1991-03-04
JPH0868762A1996-03-12
JPH07231023A1995-08-29
Attorney, Agent or Firm:
Patent Corporation yki International Patent Office



 
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