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Title:
ACTIVE FLUID JET POLISHING METHOD HAVING REVOLUTION AND ROTATION FUNCTIONS
Document Type and Number:
WIPO Patent Application WO/2022/257964
Kind Code:
A1
Abstract:
An active fluid jet polishing method having revolution and rotation functions. In the polishing process, a polishing liquid (5) having constant pressure passes through an eccentric nozzle of a polishing tool head (1). Under the action of the polishing liquid (5) flowing at the constant pressure, the polishing solution (5) enables a polishing pin (2) in the eccentric nozzle to realize a rotation (7) by means of the polishing pin (2). At the same time, the polishing tool head (1) rotates to drive the polishing pin (2) in the eccentric nozzle to realize a revolution (6). Under the action of the revolution (6) and the rotation (7) of the polishing pin (2), and the pressure of the polishing solution (5) on the axial direction of the polishing pin (2), the material of an optical element (3) in contact with the polishing pin (2) is removed. According to the active fluid jet polishing method having revolution and rotation functions, the polishing pin is required to not only revolve around a rotary shaft of a tool, but also rotate around a rotary shaft of the polishing pin, so that the purpose of a more ideal removal function shape having a large center removal amount and an excessively gentle edge of a polishing contact area, and low revolution speed requirement of the polishing contact area is achieved.

Inventors:
BI CHUNLI (CN)
ZHANG HAITAO (CN)
LI YUANMING (CN)
Application Number:
PCT/CN2022/097622
Publication Date:
December 15, 2022
Filing Date:
June 08, 2022
Export Citation:
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Assignee:
CHANGCHUN INST OPTICS FINE MECH & PHYSICS CAS (CN)
International Classes:
B24B13/01; B24B13/00; B24B57/02
Foreign References:
CN113245956A2021-08-13
JP2001038592A2001-02-13
CN103707154A2014-04-09
JP2003011058A2003-01-15
CN111890240A2020-11-06
CN111571368A2020-08-25
Attorney, Agent or Firm:
SHENZHEN KEJIN INTELLECTUAL PROPERTY OFFICE (CN)
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