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Title:
ALUMINUM NITRIDE SUBSTRATE AND GROUP-III NITRIDE LAMINATE
Document Type and Number:
WIPO Patent Application WO/2014/042054
Kind Code:
A1
Abstract:
[Problem] The purpose of the present invention is to provide a high-efficiency, high-quality group-III nitride semiconductor element, and to provide a novel aluminum nitride substrate (aluminum nitride single-crystal substrate) for fabricating the group-III nitride semiconductor element. [Solution] A substrate comprising aluminum nitride, wherein the aluminum nitride substrate has on at least a surface thereof an aluminum nitride single-crystal layer having as a principal face a face that is inclined 0.05° to 0.40° in the m-axis direction from the (0001) face of a wurzite structure.

Inventors:
HIRONAKA KEIICHIRO (JP)
KINOSHITA TORU (JP)
Application Number:
PCT/JP2013/073806
Publication Date:
March 20, 2014
Filing Date:
September 04, 2013
Export Citation:
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Assignee:
TOKUYAMA CORP (JP)
International Classes:
C30B25/20; C30B29/38; H01L21/205; H01L33/32; H01S5/343
Foreign References:
JP2009147319A2009-07-02
JP2010030799A2010-02-12
JP2009132569A2009-06-18
JPH11233391A1999-08-27
JP2007005526A2007-01-11
JP2009135441A2009-06-18
JP2009190960A2009-08-27
JP2009161390A2009-07-23
Other References:
X.Q. SHEN; H. OKUMURA, JOURNAL OF CRYSTAL GROWTH, vol. 300, 2007, pages 75 - 78
Y. KUMAGAI, APPLIED PHYSICS EXPRESS, vol. 5, 2012, pages 055504
See also references of EP 2896725A4
Attorney, Agent or Firm:
MAEDA & SUZUKI (JP)
Maeda and a Suzuki international patent business corporation (JP)
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