Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
ANTIREFLECTION FILM
Document Type and Number:
WIPO Patent Application WO/2013/180084
Kind Code:
A1
Abstract:
An antireflection film characterized by comprising a porous silica having a porosity of 25-75 vol%, having a film thickness of 50-1,100 nm, and having an elasticity of at least 10 GPa. This antireflection film has a low refractive index and has high scratch resistance.

More Like This:
JP2012163794REFLECTION SUPPRESSING FILM AND MANUFACTURING METHOD THEREFOR
JP5876440Image display device
JP2003043205OPTICAL MEMBER, ELECTRO-OPTICAL DEVICE, ELECTRONIC APPLIANCE METHOD FOR MANUFACTURING OPTICAL MEMBER
Inventors:
MATSUURA MIKIYA (JP)
MAEKAWA KAZUHIKO (JP)
TANABE HIROFUMI (JP)
Application Number:
PCT/JP2013/064683
Publication Date:
December 05, 2013
Filing Date:
May 28, 2013
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
KURARAY CO (JP)
International Classes:
G02B1/11
Domestic Patent References:
WO2005001525A12005-01-06
Foreign References:
JP2006341475A2006-12-21
JP2003520745A2003-07-08
JP2007507342A2007-03-29
Attorney, Agent or Firm:
TAKASHIMA, HAJIME (JP)
Takashima 1 (JP)
Download PDF:
View/Download PDF      PDF Help



 
Previous Patent: LITHIUM ION SECONDARY BATTERY

Next Patent: SPHYGMOMANOMETER DEVICE