Title:
APPARATUS FOR PLASMA TREATMENT AND METHOD FOR PLASMA TREATMENT
Document Type and Number:
WIPO Patent Application WO/2012/066779
Kind Code:
A1
Abstract:
An apparatus for plasma treatment contains a process vessel provided with a mounting table for mounting a substrate, a first gas supplying unit configured to supply a first gas into the process vessel, a first plasma generating unit configured to convert at least a part of the first gas to a first plasma, a second gas supplying unit configured to supply a second gas into the process vessel, and a second plasma generating unit configured to convert at least a part of the second gas to a second plasma. A height of an inlet of the second gas from the mounting table is lower than a height of an inlet of the first gas from the mounting table.
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Inventors:
NOZAWA TOSHIHISA (JP)
TIAN CAIZHONG (JP)
SASAKI MASARU (JP)
MIHARA NAOKI (JP)
MATSUMOTO NAOKI (JP)
MOYAMA KAZUKI (JP)
YOSHIKAWA JUN (JP)
TIAN CAIZHONG (JP)
SASAKI MASARU (JP)
MIHARA NAOKI (JP)
MATSUMOTO NAOKI (JP)
MOYAMA KAZUKI (JP)
YOSHIKAWA JUN (JP)
Application Number:
PCT/JP2011/006391
Publication Date:
May 24, 2012
Filing Date:
November 16, 2011
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
NOZAWA TOSHIHISA (JP)
TIAN CAIZHONG (JP)
SASAKI MASARU (JP)
MIHARA NAOKI (JP)
MATSUMOTO NAOKI (JP)
MOYAMA KAZUKI (JP)
YOSHIKAWA JUN (JP)
NOZAWA TOSHIHISA (JP)
TIAN CAIZHONG (JP)
SASAKI MASARU (JP)
MIHARA NAOKI (JP)
MATSUMOTO NAOKI (JP)
MOYAMA KAZUKI (JP)
YOSHIKAWA JUN (JP)
International Classes:
H01L21/3065; H01L21/205; H01L21/31
Domestic Patent References:
| WO2009107718A1 | 2009-09-03 |
Foreign References:
| JPH09115880A | 1997-05-02 | |||
| JP2009302324A | 2009-12-24 | |||
| JP2003142460A | 2003-05-16 |
Attorney, Agent or Firm:
MASUTANI, Tsuyoshi (701 1-16 Kitaueno 2-chome, Taito-k, Tokyo 14, JP)
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Claims: