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Patent Searching and Data


Title:
APPLICATION SOLUTION FOR FORMATION OF COATING FILM FOR SPRAY APPLICATION AND COATING FILM
Document Type and Number:
WIPO Patent Application WO/2011/136370
Kind Code:
A1
Abstract:
Disclosed is a method for forming an antireflective coating film that can easily form an antireflective film even on articles, such as photovoltaic cells, that have roughness on the back surface and cannot be secured by suction. Also disclosed is an antireflective coating film forming agent that uses this method. Also disclosed is an application solution for formation of a coating film for spray application characterized by containing a component (A), component (B), and component (C). Component (A): polysiloxane having an organic group that contains fluorine, Component (B): C4-8 glycol ether, Component (C): one or more solvents selected from a group formed from C3-10 cyclic alcohols and C3-10 glycols.

Inventors:
NEGI TAKAYUKI (JP)
MOTOYAMA KENICHI (JP)
Application Number:
PCT/JP2011/060460
Publication Date:
November 03, 2011
Filing Date:
April 28, 2011
Export Citation:
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Assignee:
NISSAN CHEMICAL IND LTD (JP)
NEGI TAKAYUKI (JP)
MOTOYAMA KENICHI (JP)
International Classes:
C09D183/08; C08G77/24; C09D5/00; C09D7/12
Domestic Patent References:
WO2008059844A12008-05-22
Foreign References:
JP2003202813A2003-07-18
JPH06192575A1994-07-12
JP2007016096A2007-01-25
Attorney, Agent or Firm:
SENMYO, Kenji et al. (JP)
Spring name Kenji (JP)
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Claims: