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Patent Searching and Data


Title:
ARC EVAPORATION SOURCE
Document Type and Number:
WIPO Patent Application WO/2016/017374
Kind Code:
A1
Abstract:
Provided is an arc evaporation source that can stably hold an arc spot at the tip surface of a target and is moreover capable of achieving greater device compactness. The arc evaporation source 1 is provided with: a target 3 that is melted from the tip surface 3a and evaporates by means of an arc discharge; and at least one magnet 4 disposed at a position separated in the radial direction of the target 3 from the lateral surface 3b of the target 3. The magnet 4 is disposed, at the lateral surface 3b of the target 3, in the range of up to 10 mm from the tip surface 3a of the target 3 in the axial direction of the target 3 in a manner so as to form a magnetic field MF1 satisfying conditions a) and b), namely that a) the angle formed by the lines of magnetic force of the magnetic field with respect to the lateral surface 3b of the target 3 is no greater than 45 degrees, and b) the component in the axial direction of the target 3 in the strength of the lines of magnetic force is at least 200 G.

Inventors:
KUROKAWA YOSHINORI
HIROTA SATOSHI
TANIFUJI SHINICHI
Application Number:
PCT/JP2015/069340
Publication Date:
February 04, 2016
Filing Date:
July 03, 2015
Export Citation:
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Assignee:
KOBE STEEL LTD (JP)
International Classes:
C23C14/32
Domestic Patent References:
WO2013191038A12013-12-27
Foreign References:
JP2012188730A2012-10-04
JP2012188732A2012-10-04
JP2005002454A2005-01-06
JP2001152319A2001-06-05
Other References:
See also references of EP 3156516A4
Attorney, Agent or Firm:
KOTANI, Etsuji et al. (JP)
Etsuji Kotani (JP)
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