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Title:
ARRAY SUBSTRATE PREPARATION METHOD
Document Type and Number:
WIPO Patent Application WO/2020/118984
Kind Code:
A1
Abstract:
The present invention provides an array substrate preparation method, comprising: S10, providing a substrate, a first metal layer and a second metal layer located on the first metal layer being formed on a surface of the substrate, and the first metal layer and the second metal layer having different materials and different etching rates; S20, forming a photoresist pattern on a surface of the second metal layer; S30, pre-processing the second metal layer to change the etching rate thereof, so that the etching rates of the first metal layer and the second metal layer are equivalent.

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Inventors:
YIN YIBIAO (CN)
Application Number:
PCT/CN2019/082167
Publication Date:
June 18, 2020
Filing Date:
April 11, 2019
Export Citation:
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Assignee:
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECH CO LTD (CN)
International Classes:
H01L21/3213
Foreign References:
CN102347274A2012-02-08
CN1945799A2007-04-11
CN107104044A2017-08-29
Attorney, Agent or Firm:
ESSEN PATENT & TRADEMARK AGENCY (CN)
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