BLOCK COPOLYMER COMPOSITION, PROCESS FOR PRODUCING THE SAME, AND PRESSURE-SENSITIVE ADHESIVE COMPOSITION

Title:

BLOCK COPOLYMER COMPOSITION, PROCESS FOR PRODUCING THE SAME, AND PRESSURE-SENSITIVE ADHESIVE COMPOSITION

Document Type and Number:

WIPO Patent Application WO/1999/058605

Kind Code:

A1

Abstract:

A composition which comprises as a major component a radial poly(aromatic vinyl)/polyisoprene block copolymer and is usable as a better pressure-sensitive adhesive ingredient. The composition is obtained by reacting a diblock polymer with a coupling agent having a functionality of 4 or higher in the presence of a coupling accelerator. It comprises (a) 1 to 34 wt.% diblock polymer, (b) 34 to 99 wt.% four-branch polymer, and (c) 0 to 50 wt.% two-branch polymer and/or three-branch polymer. In the composition, the poly(aromatic vinyl)/polyisoprene block copolymer has a weight-average molecular weight (M¿w?) of 260,000 to 500,000. The content of the poly(aromatic vinyl) block in the copolymer is 5 to 24 wt.%.

Inventors:

KOMATSUZAKI SHIGERU (JP)
MATSUBARA TETSUAKI (JP)
ISHIHARA JUN (JP)

Application Number:

PCT/JP1999/002465

Publication Date:

November 18, 1999

Filing Date:

May 13, 1999

Export Citation:

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Assignee:

NIPPON ZEON CO (JP)
KOMATSUZAKI SHIGERU (JP)
MATSUBARA TETSUAKI (JP)
ISHIHARA JUN (JP)

International Classes:

C08F297/04; C08L53/02; C09D153/02; C09J153/02; C09J201/00; (IPC1-7): C08L53/02; C09J153/02; C08F297/04

Foreign References:

JPH06279744A	1994-10-04
JPH10130349A	1998-05-19
JPH10158350A	1998-06-16

Other References: