CHARGED PARTICLE BEAM MICROSCOPE, AND METHOD FOR CORRECTING MEASURED IMAGE USING SAME

WIPO Patent Application WO/2012/111054

A1

The purpose of the present invention is to correct image distortion due to influence of a drift of a stage using a smaller number of images without waiting for stop of stage movement. In order to achieve the purpose, this invention measures an image for reference (202) for distortion correction, at a position and a magnification identical to those of an image (201) to be obtained for the purpose of observation. At that time, in order to reduce influence of drift, the image for reference is measured in a time shorter than that in which conventional images for observation are measured. The shape of the image for observation is corrected by comparing the shape of the image for reference and the shape of the image for observation with each other, and distortion is reduced.

JP4832375	Sample image formation method and charged particle beam device
JP2024044936	Multi-electron beam adjustment method and multi-electron beam inspection device
JPS61101947	IMAGE PHOTOGRAPH SYSTEM FOR ELECTRON MICROSCOPE

DONG SHUANGQI (JP)
SATO NORIO (JP)
KOYAMA SUSUMU (JP)

PCT/JP2011/006128

August 23, 2012

November 02, 2011

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HITACHI HIGH TECH CORP (JP)
DONG SHUANGQI (JP)
SATO NORIO (JP)
KOYAMA SUSUMU (JP)

H01J37/22; H01J37/153; H01J37/20

WO2011007492A1

2011-01-20

JPH07272665A	1995-10-20
JP2009110734A	2009-05-21
JP2003086126A	2003-03-20
JP2000331637A	2000-11-30
JP2007200784A	2007-08-09

INOUE, Manabu et al. (JP)
Manabu Inoue (JP)

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