COATING FILM FORMING METHOD AND COATING FILM FORMED THEREBY

WIPO Patent Application WO/2019/132550

A1

An embodiment of the present invention relates to a coating film forming method and a coating film formed thereby. The technical objective is to provide: a coating film forming method for mixing a yttrium oxide (Y2O3) powder and a yttrium fluoride (YF3) powder in predetermined diameter ranges and in a predetermined weight ratio, and pulverizing the mixture powder by allowing the mixture powder to collide with a substrate by aerosol deposition, thereby enabling a yttrium oxide fluoride coating film having desired XRD crystal characteristics and an EDS atomic ratio, which are suitable for a processing environment, to be implemented at low cost; and a coating film formed thereby. To this end, disclosed in an embodiment of the present invention are a coating film forming method and a coating film formed thereby, the method comprising the steps of: providing a mixture powder comprising yttrium (Y), oxygen (O) and fluorine (F); and forming a YOF coating film on a substrate by using the mixture powder, wherein the atomic ratio of Y:O:F according to X-ray photoelectron spectroscopy (XPS), of the YOF coating film, is 1:1:1.

JP2511454	[Title of Invention] Semiconductor Substrate Processing Device
WO/2001/099168	SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE THEREOF
JP2009176918	METHOD OF MANUFACTURING SOI SUBSTRATE

KIM BYUNG KI (KR)
PARK JAE HYUK (KR)
SEOK HYE WON (KR)

PCT/KR2018/016785

July 04, 2019

December 27, 2018

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IONES CO LTD (KR)

H01L21/02; H01L21/3065; H01L21/56

KR20170078842A	2017-07-07
JP2016211072A	2016-12-15
JP2017190475A	2017-10-19
JP2017534001A	2017-11-16
JP6189570B2	2017-08-30

SUNGAM SUH INTERNATIONAL PATENT & LAW FIRM (KR)

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