Title:
DEFECT-CAUSING-STEP ANALYSIS DEVICE AND DEFECT-CAUSING-STEP ANALYSIS METHOD
Document Type and Number:
WIPO Patent Application WO/2013/187430
Kind Code:
A1
Abstract:
A linking unit (17) of a defect-causing-step analysis device (16) reads lighting defect information and TFT correction information relating to a single liquid crystal display panel from an information management database (9) and correlates (performs so-called linking) both types of results. A classifying unit (18) classifies the lighting defect information by the TFT correction information. A superposition mapping unit (19) superposes and maps the classified lighting defect information on the same coordinates in relation to one or several lots of the liquid crystal display panel. A map display unit (20) displays one or a plurality of superposed maps set in advance or specified by an operator from among a plurality of superposed maps obtained as described above. Analysis is thus performed as to whether the cause of a defect detected by a final inspection is due to a process step or an inspection step.
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Inventors:
TOYA MASAO
IMAI KATSUKI
IMAI KATSUKI
Application Number:
PCT/JP2013/066169
Publication Date:
December 19, 2013
Filing Date:
June 12, 2013
Export Citation:
Assignee:
SHARP KK (JP)
International Classes:
G01N21/88; G01M11/00; G02F1/13
Foreign References:
| JP2006251561A | 2006-09-21 | |||
| JP2008158501A | 2008-07-10 | |||
| JPH10177844A | 1998-06-30 | |||
| JP2009264865A | 2009-11-12 |
Attorney, Agent or Firm:
SAMEJIMA, Mutsumi et al. (JP)
Mutsumi Sameshima (JP)
Mutsumi Sameshima (JP)
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