Title:
DOMAIN WALL DISPLACEMENT ELEMENT, MAGNETIC ARRAY, AND METHOD FOR MANUFACTURING DOMAIN WALL DISPLACEMENT ELEMENT
Document Type and Number:
WIPO Patent Application WO/2022/185410
Kind Code:
A1
Abstract:
The domain wall displacement element according to the present embodiment comprises: a magnetoresistance element having a reference layer that includes a ferromagnetic body, and also having a domain wall displacement layer and a non-magnetic layer; and a first magnetized fixed layer and a second magnetized fixed layer that are set apart from each other, each of the first and second magnetized fixed layers directly or interectly contacting the domain wall displacement layer. The first magnetized fixed layer has a first region contacting the domain wall displacement layer, a non-magnetic intermediate layer located closest to the first region, and a second region contacting the first intermediate layer. The first region has a first ferromagnetic layer contacting the first intermediate layer. The second region has a second ferromagnetic layer contacting the first intermediate layer. The first and second ferromagnetic layers are ferromagnetically linked. The ferromagnetic layer located closest to the domain wall displacement layer within the first region, and the ferromagnetic layer located closest to the domain wall displacement layer within the second magnetized fixed layer, have the same film configuration. The first and second regions have different film configurations.
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Inventors:
YAMADA SHOGO (JP)
SHIBATA TATSUO (JP)
SHIBATA TATSUO (JP)
Application Number:
PCT/JP2021/007951
Publication Date:
September 09, 2022
Filing Date:
March 02, 2021
Export Citation:
Assignee:
TDK CORP (JP)
International Classes:
H01L21/8239; H01L27/105
Domestic Patent References:
| WO2015068509A1 | 2015-05-14 | |||
| WO2016182085A1 | 2016-11-17 |
Foreign References:
| JP2010219156A | 2010-09-30 | |||
| JP2014036146A | 2014-02-24 | |||
| JP2010219104A | 2010-09-30 |
Attorney, Agent or Firm:
TANAI Sumio et al. (JP)
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