Title:
ELECTRON BEAM DRAWING DEVICE AND ELECTRON BEAM DRAWING METHOD
Document Type and Number:
WIPO Patent Application WO/2024/057429
Kind Code:
A1
Abstract:
An electron beam drawing device according to one embodiment of the present invention is characterized by comprising: an emission source for emitting an electron beam; a stage on which is placed a material on which a pattern is drawn using the electron beam; a potential regulating member that is arranged so as to be upstream of the material when the material is placed on the stage, and that is set to a positive fixed potential relative to the material; a potential application circuit for applying a voltage to the material or the potential regulating member such that the potential regulating member achieves the aforementioned fixed potential; and a correction circuit for correcting misalignment of the electron beam on the material surface occurring when the material is irradiated with the electron beam in a state in which the potential regulating member is at the aforementioned fixed potential.
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Inventors:
NOMURA HARUYUKI (JP)
MORITA HIROFUMI (JP)
MORITA HIROFUMI (JP)
Application Number:
PCT/JP2022/034317
Publication Date:
March 21, 2024
Filing Date:
September 14, 2022
Export Citation:
Assignee:
NUFLARE TECHNOLOGY INC (JP)
International Classes:
H01J37/305; H01L21/027
Foreign References:
| JP2018170435A | 2018-11-01 | |||
| JP2021180224A | 2021-11-18 | |||
| JP2013120634A | 2013-06-17 |
Attorney, Agent or Firm:
IKEGAMI, Tetsuma et al. (JP)
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