Title:
ELECTRON BEAM IRRADIATION DEVICE
Document Type and Number:
WIPO Patent Application WO/2014/156170
Kind Code:
A1
Abstract:
Provided is an electron beam generation device having increased parallelism which increases throughput of an electron beam irradiation device, and having increased exposure precision. A first embodiment of the present invention provides an electron beam irradiation device that irradiates a drawing pattern by a plurality of electron beams, on to a target object and comprises: a planar electron beam source having a plurality of electron beam generation sources that output the plurality of electron beams arranged thereon; and a control unit that adjusts the electron beam output time for each of the plurality of electron beam generation sources.
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Inventors:
MIYAGUCHI HIROSHI (JP)
Application Number:
PCT/JP2014/001796
Publication Date:
October 02, 2014
Filing Date:
March 27, 2014
Export Citation:
Assignee:
UNIV TOHOKU (JP)
International Classes:
H01L21/027; G03F7/20; G21K5/04; H01J37/06; H01J37/305
Foreign References:
| JPH07297094A | 1995-11-10 | |||
| JP2007538398A | 2007-12-27 | |||
| JPH10104651A | 1998-04-24 | |||
| JP2012104610A | 2012-05-31 | |||
| JP2006186125A | 2006-07-13 |
Other References:
NAOKATSU IKEGAMI ET AL.: "Active-matrix nanocrystalline Si electron emitter array for massively parallel direct-write electron-beam system: first results of the performance evaluation", JOURNAL OF MICRO/NANO LITHOGRAPHY, MEMS, AND MOEMS, vol. 11, no. 3, pages 031406
TAKAHIRO WATAYA ET AL.: "An Electron Source Driver Circuit and Its Power Reduction for Compensation of Electron Beam Aberration of Massively Parallel Electron Beam Lithography", THE INSTITUTE OF ELECTRICAL ENGINEERS OF JAPAN MICROMACHINE ยท SENSOR SYSTEM KENKYUKAI SHIRYO, vol. MSS-12-1, 11 June 2012 (2012-06-11), pages 87 - 92
HITOSHI NISHINO ET AL.: "Cho Heiretsu Denshisen Byoga no Tameno LSI Shusekika Pierse-gata Men Denshigen Array no Sakusei Hoho no Kiso Kento", HEISEI 25 NEN NATIONAL CONVENTION RECORD I.E.E. JAPAN, 5 March 2013 (2013-03-05), THE INSTITUTE OF ELECTRICAL ENGINEERS OF JAPAN, pages 3 - 127
TAKAHIRO WATAYA ET AL.: "An Electron Source Driver Circuit and Its Power Reduction for Compensation of Electron Beam Aberration of Massively Parallel Electron Beam Lithography", THE INSTITUTE OF ELECTRICAL ENGINEERS OF JAPAN MICROMACHINE ยท SENSOR SYSTEM KENKYUKAI SHIRYO, vol. MSS-12-1, 11 June 2012 (2012-06-11), pages 87 - 92
HITOSHI NISHINO ET AL.: "Cho Heiretsu Denshisen Byoga no Tameno LSI Shusekika Pierse-gata Men Denshigen Array no Sakusei Hoho no Kiso Kento", HEISEI 25 NEN NATIONAL CONVENTION RECORD I.E.E. JAPAN, 5 March 2013 (2013-03-05), THE INSTITUTE OF ELECTRICAL ENGINEERS OF JAPAN, pages 3 - 127
Attorney, Agent or Firm:
RYUKA IP LAW FIRM (JP)
Ryuka international patent business corporation (JP)
Ryuka international patent business corporation (JP)
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