Title:
EXPOSURE DEVICE AND OBJECT TO BE EXPOSED
Document Type and Number:
WIPO Patent Application WO/2007/018029
Kind Code:
A1
Abstract:
A color filter substrate (6) having an alignment mark is placed on a predetermined
position of one end of a pattern region set on a surface. The color filter substrate
(6) is conveyed by convey means (1) with the alignment mark ahead. Imaging means
(3) images the alignment mark and a pixel. Control means (4) calculates a difference
between a reference position on the color filter substrate (6) according to the
alignment mark detection output obtained by the imaging means (3) and a reference
position preset on a photo-mask (17) of an exposure optical system (2), moves
the imaging means (3) and the exposure optical system (2) as a unitary block in
a direction vertical to the convey direction of the color filter substrate (6)
within a plane parallel to the surface of the convey means (1) on which the color
filter substrate is placed, and applies exposure light emitted from an exposure
light source (12) via the photo-mask (17) to the color filter substrate (6).
More Like This:
Inventors:
KAJIYAMA KOICHI (JP)
WATANABE YOSHIO (JP)
WATANABE YOSHIO (JP)
Application Number:
PCT/JP2006/314545
Publication Date:
February 15, 2007
Filing Date:
July 24, 2006
Export Citation:
Assignee:
V TECHNOLOGY CO LTD (JP)
KAJIYAMA KOICHI (JP)
WATANABE YOSHIO (JP)
KAJIYAMA KOICHI (JP)
WATANABE YOSHIO (JP)
International Classes:
G03F9/00; H01L21/68
Foreign References:
| JPH09127702A | 1997-05-16 | |||
| JP2003043939A | 2003-02-14 | |||
| JPH0766113A | 1995-03-10 |
Attorney, Agent or Firm:
SASAJIMA, Fujio et al. (19-5 Toranomon 1-chom, Minato-ku Tokyo01, JP)
Download PDF: