Title:
EXPOSURE METHOD AND EXPOSURE DEVICE, AND METHOD FOR FORMING OPTICAL ANISOTROPIC LAYER
Document Type and Number:
WIPO Patent Application WO/2023/085257
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing an exposure method and an exposure device which make it possible to obtain a photo-alignment film having a high-accuracy alignment pattern, and a method for forming an optical anisotropic layer. The problem is solved by collecting linearly polarized light in a ring shape by an optical member, and when a film having a compound having a photo-alignable group is exposed, relatively moving the film and the optical member in a direction inclined with respect to the optical axis of the optical member while rotating the polarization direction of the polarized light.
Inventors:
ANDO HIROTOSHI (JP)
HARASAWA TAKEHIKO (JP)
NAGANO SATOSHI (JP)
SEKIZAWA YASUHIRO (JP)
HARASAWA TAKEHIKO (JP)
NAGANO SATOSHI (JP)
SEKIZAWA YASUHIRO (JP)
Application Number:
PCT/JP2022/041520
Publication Date:
May 19, 2023
Filing Date:
November 08, 2022
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G02B5/30; G02F1/1337; G03F7/20
Domestic Patent References:
| WO2016183602A1 | 2016-11-24 | |||
| WO2020066429A1 | 2020-04-02 | |||
| WO2020022513A1 | 2020-01-30 |
Foreign References:
| JP2008233903A | 2008-10-02 | |||
| JP2015532468A | 2015-11-09 |
Attorney, Agent or Firm:
ITOH Hideaki et al. (JP)
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