Title:
FERROMAGNETIC MATERIAL SPUTTERING TARGET
Document Type and Number:
WIPO Patent Application WO/2018/047978
Kind Code:
A1
Abstract:
Provided is a BN-containing ferromagnetic material sputtering target which is capable of suppressing the formation of particles during a sputtering process. A sputtering target which contains 1-40 at% of B and 1-30 at% of N, while having a structure that has a metal phase containing a ferromagnetic metal and a non-magnetic material phase. The X-ray diffraction profile as obtained by analyzing the structure by means of an X-ray diffraction method has a diffraction peak that is ascribed to cubic boron nitride.
Inventors:
SATO ATSUSHI (JP)
Application Number:
PCT/JP2017/032932
Publication Date:
March 15, 2018
Filing Date:
September 12, 2017
Export Citation:
Assignee:
JX NIPPON MINING & METALS CORP (JP)
International Classes:
C23C14/34
Domestic Patent References:
| WO2016047236A1 | 2016-03-31 | |||
| WO2016047578A1 | 2016-03-31 | |||
| WO2014185266A1 | 2014-11-20 |
Foreign References:
| JP2004532931A | 2004-10-28 | |||
| JP2016084538A | 2016-05-19 | |||
| JP2003313659A | 2003-11-06 |
Attorney, Agent or Firm:
AXIS PATENT INTERNATIONAL (JP)
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