Title:
FILM FORMING DEVICE AND FILM FORMING METHOD
Document Type and Number:
WIPO Patent Application WO/2014/156129
Kind Code:
A1
Abstract:
Provided is a film forming device which forms a film by vapor deposition while receiving assistance from plasma and carries out vapor deposition stably over a long period of time. This film forming device (1) vapor deposits a vapor deposition material (M) on a film base material (W) while transporting the film base material (W) by a roll-to-roll method under pressure, and is characterized in that: the film forming device (1) has a chamber (2) in which the internal pressure is reduced, a pair of rollers (3, 3) that are disposed within the chamber (2), guide the base material film within the chamber (2) and also roll the base material film on the peripheral surfaces thereof, a vaporization device (4) that vaporizes the vapor deposition material (M), a plasma generating power supply (5) that applies an alternating current voltage between the pair of rollers (3, 3), and a means (6) for introducing gas into the chamber (2); and the pair of rollers (3, 3) have plasma generated on the surfaces that hold the film base material (W), and the vaporization means (4) vaporize the vapor deposition material (M) as well as vapor deposit the same as a coating on the surface of the film base material (W).
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Inventors:
TAMAGAKI HIROSHI
Application Number:
PCT/JP2014/001715
Publication Date:
October 02, 2014
Filing Date:
March 25, 2014
Export Citation:
Assignee:
KOBE STEEL LTD (JP)
International Classes:
C23C14/56
Domestic Patent References:
| WO2012046778A1 | 2012-04-12 | |||
| WO2011052764A1 | 2011-05-05 | |||
| WO2013047279A1 | 2013-04-04 |
Foreign References:
| JP2010265527A | 2010-11-25 | |||
| JP2014001444A | 2014-01-09 |
Attorney, Agent or Firm:
KOTANI, Etsuji et al. (JP)
Etsuji Kotani (JP)
Etsuji Kotani (JP)
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