Title:
FILM MASK, METHOD FOR MANUFACTURING SAME, AND METHOD FOR FORMING PATTERN USING FILM MASK AND PATTERN FORMED THEREBY
Document Type and Number:
WIPO Patent Application WO/2017/131499
Kind Code:
A1
Abstract:
The present application relates to a film mask, a method for manufacturing same, and a method for forming a pattern using a film mask and a pattern formed thereby, the film mask comprising: a transparent substrate; a darkened light-shielding pattern layer provided on top of the transparent substrate; and groove portions provided in an area where the darkened light-shielding pattern layer is not provided.
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Inventors:
HWANG JI YOUNG (KR)
SEO HAN MIN (KR)
HAN SANGCHOLL (KR)
LEE SEUNG HEON (KR)
OH DONG HYUN (KR)
SEO DAE HAN (KR)
BAE NAM SEOK (KR)
SONG MIN SOO (KR)
SEO HAN MIN (KR)
HAN SANGCHOLL (KR)
LEE SEUNG HEON (KR)
OH DONG HYUN (KR)
SEO DAE HAN (KR)
BAE NAM SEOK (KR)
SONG MIN SOO (KR)
Application Number:
PCT/KR2017/001033
Publication Date:
August 03, 2017
Filing Date:
January 31, 2017
Export Citation:
Assignee:
LG CHEMICAL LTD (KR)
International Classes:
G03F7/20; H01L21/033
Foreign References:
| KR20120019241A | 2012-03-06 | |||
| KR20150004647A | 2015-01-13 | |||
| KR20130061657A | 2013-06-11 | |||
| KR20090003601A | 2009-01-12 | |||
| JP2010060681A | 2010-03-18 |
Other References:
See also references of EP 3410215A4
Attorney, Agent or Firm:
CHUNG, Soon-Sung (KR)
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