Title:
FUMED SILICA AND PRODUCTION METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2018/079334
Kind Code:
A1
Abstract:
Provided is a fumed silica for chemical-mechanical polishing with which post-polishing scratches occurring on a surface of an object to be polished can be significantly reduced, and which is important for miniaturization and multi-layering of a structure. The fumed silica according to the present invention has a BET specific surface area of 57-400 m2/g. In a liquid dispersion which is obtained by ultrasonically dispersing 6.25 mass% of this fumed silica in water at a vibration frequency of 20 kHz and an amplitude of 15-25 μm for 3 minutes, the amount of residues on a sieve is 5 ppm or less as measured by wet sieving using an electroformed sieve having a mesh opening size of 5 μm.
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Inventors:
UEDA MASAHIDE (JP)
TAKATA YUKIHIRO (JP)
HORITSUNE JUNYA (JP)
TAKATA YUKIHIRO (JP)
HORITSUNE JUNYA (JP)
Application Number:
PCT/JP2017/037482
Publication Date:
May 03, 2018
Filing Date:
October 17, 2017
Export Citation:
Assignee:
TOKUYAMA CORP (JP)
International Classes:
C01B33/18; B24B37/00; C03B8/04; C03B20/00; C09K3/14; H01L21/304
Domestic Patent References:
WO2015012118A1 | 2015-01-29 |
Foreign References:
JP2008019157A | 2008-01-31 | |||
JP2014214042A | 2014-11-17 |
Other References:
See also references of EP 3533760A4
Attorney, Agent or Firm:
MAEDA & PARTNERS (JP)
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