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Patent Searching and Data


Title:
LIQUID INTRODUCTION METHOD FOR FLOW PASSAGE DEVICE
Document Type and Number:
WIPO Patent Application WO/2023/189163
Kind Code:
A1
Abstract:
This liquid introduction method for a flow passage device comprises a preparation step, a filling step, a first suction step, and an introduction step. In the preparation step: a second opening of the flow passage device, which includes therein a flow passage section through which the liquid can circulate between a first opening and the second opening, is connected to a first outlet/inlet of a switching section having first to third outlet/inlets so that liquid can circulate; and an internal region of a liquid storage section and the second outlet/inlet, an intake/discharge section and the third outlet/inlet, and a liquid supply section and the first opening are connected so that liquid can circulate. In the filling step, the liquid supply section fills, with a second liquid, a flow passage extending from the liquid supply section to the liquid storage section, with the liquid being capable of circulating between the first outlet/inlet and the second outlet/inlet. In the first suction step, the intake/discharge section suctions a first liquid from the liquid storage section, with the liquid being capable of circulating between the second outlet/inlet and the third outlet/inlet. In the introduction step, the intake/discharge section introduces the first liquid into the flow passage section, with the liquid being capable of circulating between the first outlet/inlet and the third outlet/inlet.

Inventors:
UEHARA MASAMI (JP)
SASAHARA MASAMITSU (JP)
Application Number:
PCT/JP2023/007769
Publication Date:
October 05, 2023
Filing Date:
March 02, 2023
Export Citation:
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Assignee:
KYOCERA CORP (JP)
International Classes:
G01N1/00; G01N1/04; G01N33/49; G01N35/08; G01N37/00
Domestic Patent References:
WO2020067024A12020-04-02
WO2008136057A12008-11-13
Foreign References:
JP2012177599A2012-09-13
US20090142845A12009-06-04
Attorney, Agent or Firm:
YOSHITAKE Hidetoshi et al. (JP)
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