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Title:
MAGNETORESISTANCE EFFECT ELEMENT AND MAGNETIC MEMORY CELL AND MAGNETIC RANDOM ACCESS MEMORY USING SAME
Document Type and Number:
WIPO Patent Application WO/2010/067520
Kind Code:
A1
Abstract:
Disclosed are a magnetoresistance effect element equipped with an magnesium oxide passivation layer, and a high-speed, ultra-low power consumption nonvolatile memory using said element. A tunnel magnetoresistance effect (TMR) film comprised of a ferromagnetic free layer, an insulation layer, and a ferromagnetic fixed layer is provided, and an MgO passivation layer is provided on the side walls of a protective layer and an orientation control layer, thus suppressing elemental diffusion of a tunnel magnetoresistance effect (TMR) element from each layer due to thermal processing at 350° or higher and obtaining a magnetic memory cell and magnetic random access memory having stable, high-output reading and low current writing characteristics. Furthermore, when CoFeB is used in the ferromagnetic layer and MgO is used in the insulation layer, it is preferable that the MgO passivation layer have an (001) orientation.

Inventors:
HAYAKAWA JUN (JP)
TAKAHASHI HIROMASA (JP)
Application Number:
PCT/JP2009/006122
Publication Date:
June 17, 2010
Filing Date:
November 16, 2009
Export Citation:
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Assignee:
HITACHI LTD (JP)
HAYAKAWA JUN (JP)
TAKAHASHI HIROMASA (JP)
International Classes:
H01L43/10; H01F10/16; H01F10/32; H01L21/8246; H01L27/105; H01L29/82; H01L43/08
Foreign References:
JP2009094104A2009-04-30
JP2008186861A2008-08-14
JP2007294737A2007-11-08
JP2006269530A2006-10-05
JP2007059879A2007-03-08
JP2002305337A2002-10-18
JP2005294376A2005-10-20
JP2004349671A2004-12-09
US5695864A1997-12-09
Other References:
T. MIYAZAKI, N. TEZUKA, J. MAGN. MAGN. MATER, vol. 139, 1995, pages L231
S. YUASA ET AL., NATURE MATERIAL, vol. 3, 2004, pages 868
Attorney, Agent or Firm:
POLAIRE I. P. C. (JP)
Polaire Intellectual Property Corporation (JP)
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