Title:
MASK PLATE AND METHOD FOR TESTING QUALITY OF MASK PLATE
Document Type and Number:
WIPO Patent Application WO/2021/204024
Kind Code:
A1
Abstract:
Disclosed are a mask plate and a method for testing the quality of the mask plate. The mask plate comprises a mask exposure area (12) and a non-mask exposure area (11), wherein the mask exposure area (12) is provided with a mask pattern (121); the non-mask exposure area (11) is provided with a test region (A); the test region (A) comprises at least one test mark (111); and the deviation between the design size and the actual size of the test mark (111) is used for measuring the quality of the mask plate, so as to reduce the risk of the mask plate being prone to quality problems and needing to be remanufactured.
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Inventors:
WANG MEI-LI (CN)
Application Number:
PCT/CN2021/084065
Publication Date:
October 14, 2021
Filing Date:
March 30, 2021
Export Citation:
Assignee:
CHANGXIN MEMORY TECH INC (CN)
International Classes:
G03F1/44
Foreign References:
| CN107045259A | 2017-08-15 | |||
| CN104035275A | 2014-09-10 | |||
| CN110989287A | 2020-04-10 | |||
| CN106154739A | 2016-11-23 | |||
| JPH10115910A | 1998-05-06 | |||
| US20170017149A1 | 2017-01-19 |
Attorney, Agent or Firm:
BEIJING INTELLEGAL INTELLECTUAL PROPERTY AGENT LTD. (CN)
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