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Title:
METHOD OF CARRYING SUBSTRATES DURING THE DEPOSITION OF A THIN FILM ON THE SURFACE OF SUBSTRATES AND A ROTARY TABLE FOR CARRYING THE SUBSTRATES ACCORDING TO THE METHOD
Document Type and Number:
WIPO Patent Application WO/2015/127908
Kind Code:
A4
Abstract:
During the deposition of thin surface layers on substrates (2), it is desirable that as many substrates (2) as possible are processed in a single batch in the sputtering device, while ensuring the quality of processing the surface layers on all stored substrates (2), in particular the homogeneity of the thickness of the layer (t) on each substrate (2). Currently there are tables (1) known for a sputtering device that ensure the quality of the surface layers, but their capacity is low due to the design of the sputtering device. Other tables (1), on the contrary, do not guarantee the optimum homogeneity of the layers. The invention presents a method and a rotary table (1) for execution of this method, which includes at least one rotary plate (3) on which there are arranged planetary carriers (5) for the substrates (2). The axes (6) of rotation of the planetary carriers (5) form, with the axis (4) of rotation of the rotary plate (1), an angle (a) ranging from 15° to 75°. The number of rotary plates (3) on the cage of the rotary table (1) can be easily changed so that the rotary table (1) accommodates the highest possible number of substrates (2) while maintaining the quality of the deposited surface layers. The high storage capacity of the rotary table (1) is ensured by the spatial arrangement of the substrates (2).

Inventors:
KADLEC STANISLAV (CZ)
PLĹHAL PETR (CZ)
VYSKOČIL JIŘÍ (CZ)
Application Number:
PCT/CZ2015/000014
Publication Date:
October 15, 2015
Filing Date:
February 23, 2015
Export Citation:
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Assignee:
HVM PLASMA SPOL S R O (CZ)
International Classes:
C23C14/35; C23C14/08; C23C14/22; C23C14/50; C23C14/54
Attorney, Agent or Firm:
PATENTCENTRUM SEDLÁK & PARTNERS S.R.O. (P.O.Box 1, České Budějovice, CZ)
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Claims:
AMENDED CLAIMS

received by the International Bureau on 03 September 2015 (03.09.2015)

1. A method of carrying substrates (2) during deposition of a thin surface layer on the exposed surface of substrates (2) from at least one source of particles (15) executed in a vacuum chamber (16), wherein the substrates (2) are placed on planetary carriers (5) arranged around a main axis (4) of rotation and each carrier (5) is simultaneously rotationally fixed tp the planetary axis (6) of rotation which is perpendicular to the exposed surface area of the substrate (2), exposed areas of the rotating substrates (2) make an apparent circumscribed circle (17) with a radius (Rs), while each planetary axis (6) of rotation forms, with the main axis (4) of rotation, an angle (a), and the distance (r) of the center of the apparent circle (17) from the main axis (4) of rotation is greater than the radius (Rs), characterized in that the substrates (2) are arranged around the main axis (4) of rotation in at least two parallel planes perpendicular to the main axis (4) of rotation, where the spacing (1) between adjacent plates is in the range from 0.8 Rs to 10 Rs and the values of the distance (r) and the angle (a) selected in the range from 15° to 75° are dependent on the flow of particles from the source (15).

2. A method of carrying substrates according to claim 1, characterized in that the main axis (4) of rotation is vertical, while the parallel planes form horizontal plates (3).

3. A method of carrying substrates according to claim 1 or 2, characterized in that the required size of the spacing (1) between adjacent plates depends on the size of the angle (a), the distance (r), and the turning of the exposed surfaces to the flow of particles from the sources (15).

4. A method of carrying substrates according to any of claims 1 to 3, characterized in that with a fixed size of the angle (α) and distance (r) is known size of the optimal spacing while a deviation of the spacing (l) from the size of the optimal spacing is permissible to 10% of the size of the optimal spacing

5. A method of carrying substrates according to any of claims 1 tp 3, characterized in that with a fixed size of the spacing (l) and distance (r) is known size of the optimal angle while a deviation of the size of the angle (a) from the size of the optimal angle is permissible to 6°, 6. A method of carrying substrates according to any of claims 1 to 3, characterized in that with a fixed size of the angle (a) and size of spacing (1) is known size of the optimal distance, while a deviation of the distance (r) from the size of the optimum distance is permissible to 10% of the size of the optimal distance. 7. A method of carrying substrates according to claim 6, characterized in that a deviation of the distance (r) from the required size of the optimum distance is different for each pair of adjacent parallel planes. 8. A rotary table (1) for carrying the substrates (2) during deposition of a thin surface layer on the exposed surface of the substrates (2) from at least one source of particles (15) executed in a vacuum chamber (16), including at least one rotary plate (3) which rotates around a main axis (4) of rotation of the table (1) and on which there are circularly arranged at least two planetary carriers (5) of the substrates (2), rotational around their planetary axes (6) of rotation, wherein the planetary axis (6) of rotation is simultaneously the axis of rotation of the substrate (2) and planetary axes (6) of rotation of the planetary carriers (5) form, with the main axis (4) of rotation of the table (1), an angle (a), wherein the apparent circle (17) of rotation of the exposed surface of the substrate (2) around the planetary axis (6) of rotation has a maximum radius and the rotation of each planetary carrier (5) is derived using the means of motion (7) from rotation of the rotary plate (3), while distance (r) of the planetary carriers (5) from the main axis (4) of rotation is greater than characterized in that it is formed by at least two rotary plates (3) which are connected to each other and which form a cage for the rotating table (1) which is composed of at least two columns (10) which are arranged along a main axis (4) of rotation of the rotary table (1), wherein the individual rotatable plates (3) are connected by vertical columns (10), while the range of an angle (a) is from 15° to 75°. 9. A rotary table according to claim 8, characterized In that the means of motion (7) comprises a fixed rolling track (8) and movable rolling rollers (9) engaging with a fixed rolling track (8) and connected with the axes (6) of rotation of the planetary carriers (5) which are rotationally mounted in a rotary plate (3).

10. A rotary table according to claim 8 or 9, characterized in that between the individual rotary plates (3) there are arranged spacers (11) on the columns (10), while the spacers (11), corresponding to the length, are also arranged on the main axis (4) of rotation of the table (1) between individual fixed rolling tracks (8), which are fixed on the main axis (4), wherein the spacers (11) define the spacing (1) between adjacent plates (3) in a range from 0.8 Rs to 10 Rs.

11. A rotary table according to claim 9, characterized in that the rolling rollers (9) of the planetary carriers (5) have, in the adjacent rotary plates (3), a different diameter (D) which corresponds to the differences in the speed of rotation of the planetary carriers (5) in a range from to 50% of the speed of rotation of the planetary carriers (5) of the reference rotary plate (3).

12. A rotary table according to at least one of claims 8 to 11, characterized in that the planetary carrier (5) is provided with a support means (12) for the substrate (2), wherein the support means (12) is in the form of a cross and whose ends are formed by raised edges for holding the substrate (2).

13. A rotary table according to any of claims 8 to 11, characterised in that the planetary carrier (5) is provided with a support means (12) for the substrate (2), wherein the support means (12) is in the shape of a square and/or a square with chamfered corners and at the edges of the support means (12) there are raised edges for holding the substrate (2).

14. A rotary table according to claim 9, characterized in that the planetary axis (6) of rotation of the planetary carrier (5), between the support means (12) and the rolling roller (9), is formed by a hub (13) rotationally mounted in the bushing (14), while the size of the support means (12) together with the length of the spacers (11) determine the spacing (1) of the adjacent plates (3) as well as the distance (r) of the planetary carriers (5) from the main axis (4) of rotation.

15. A rotary table according to claim 14, characterized in that the planetary carriers (5) are exchangeable, wherein the hub (13) forms, with the main axis (4) of rotation, an angle (a), and that the values of the angle (α) for each carrier (5) vary by a deviation of up to 6º from the calculated size of the optimal angle