METHOD OF COLLECTING PHOTOMASK - JAPAN SCIENCE & TECH CORP

Title:

METHOD OF COLLECTING PHOTOMASK

Document Type and Number:

WIPO Patent Application WO/2000/031589

Kind Code:

A1

Abstract:

A laser beam with a pulse width of 3-16 ps is used to correct a photomask consisting of chromium film (2) and chromium oxide film (3) formed on a substrate (1). Preferably the laser beam has a wavelength of 600-1100 nm. The laser beam of 3-16 ps pulse width selectively cuts the chromium film (2) and the chromium oxide film (3) without damage to the substrate (1), and the photomask is corrected with accuracy better than 1 $g(m)m. As a result, the mask can have sharp edges without opaque defects.

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Inventors:

KOUTA HIKARU (JP)
KONDO YUKI (JP)
HIRAO KAZUYUKI (JP)

Application Number:

PCT/JP1999/006093

Publication Date:

June 02, 2000

Filing Date:

November 02, 1999

Export Citation:

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Assignee:

JAPAN SCIENCE & TECH CORP (JP)
KOUTA HIKARU (JP)
KONDO YUKI (JP)
HIRAO KAZUYUKI (JP)

International Classes:

H01L21/027; G03F1/72; H01S3/00; (IPC1-7): G03F1/08; B23K26/02; H01L21/027

Foreign References:

JPH10307383A	1998-11-17
JPH09281691A	1997-10-31
JPH05249657A	1993-09-28
JPH0297945A	1990-04-10
US4727234A	1988-02-23

Attorney, Agent or Firm:

Ogura, Wataru (Kanamecho 3-chome Toshima-ku Tokyo, Kanamecho 3-chome Toshima-ku Tokyo, JP)

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