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Title:
METHOD FOR MANUFACTURING ARRAY SUBSTRATE, AND ARRAY SUBSTRATE AND DISPLAY APPARATUS
Document Type and Number:
WIPO Patent Application WO/2018/218880
Kind Code:
A1
Abstract:
A method for manufacturing an array substrate, and an array substrate and a display apparatus. The method for manufacturing an array substrate comprises: providing a base substrate (200); forming a semiconductor layer (213) on the base substrate (200); depositing an etching barrier layer material (221) on the semiconductor layer (213); forming an etching barrier layer (220) by means of carrying out wet etching on the etching barrier layer material (221); and forming an active layer (210) by means of carrying out dry etching on the semiconductor layer (213), wherein the active layer (210) comprises a first area (211) and a second area (212) surrounding the first area (211), and an orthographic projection, on the base substrate (200), of the etching barrier layer (220) completely coincides with an orthographic projection, on the base substrate (200), of the first area (211) of the active layer (210). By means of the manufacturing method, an on-state current and electron mobility can be increased, and a short circuit between a data line and a gate line or a common electrode line can also be avoided, thereby improving the yield of a product.

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Inventors:
CAO BINBIN (CN)
QIAN HAIJIAO (CN)
YANG CHENGSHAO (CN)
HUANG YINHU (CN)
Application Number:
PCT/CN2017/110874
Publication Date:
December 06, 2018
Filing Date:
November 14, 2017
Export Citation:
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Assignee:
BOE TECHNOLOGY GROUP CO LTD (CN)
HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO LTD (CN)
International Classes:
H01L27/32; H01L21/336; H01L21/77; H01L29/04; H01L29/786
Foreign References:
CN107195659A2017-09-22
US20130075731A12013-03-28
CN102646633A2012-08-22
CN105118864A2015-12-02
CN105679707A2016-06-15
CN101908489B2013-06-05
Attorney, Agent or Firm:
LIU, SHEN & ASSOCIATES (CN)
Download PDF:
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