Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
METHOD FOR POLISHING SPECTACLE LENS, AND METHOD FOR MANUFACTURING SPECTACLE LENS
Document Type and Number:
WIPO Patent Application WO/2023/032489
Kind Code:
A1
Abstract:
Provided is a method for polishing a spectacle lens, the method having: a step for preparing a polishing pad in which a flocked polishing pad is provided to a polishing surface that comes into contact with a plastic spectacle lens, the flocked polishing pad having a flocked part and abrasive grains adhering to the surface of the flocked part; and a step for applying pressure to bring a surface to be polished into contact with the polishing surface, and causing the polishing pad and the spectacle lens to move relative to one another while supplying a coolant to the polishing surface, thereby polishing the surface to be polished.

More Like This:
JP2007062000GRINDING WHEEL AND GRINDING METHOD
JP6654696Slurry compositions and methods for polishing organic polymer-based ophthalmic substrates, and ophthalmic lenses
JP2827540[Title of Invention] Polishing Spindle
Inventors:
SAMUKAWA MASAHIKO (JP)
OKUURA KAZUTERU (JP)
Application Number:
PCT/JP2022/027967
Publication Date:
March 09, 2023
Filing Date:
July 19, 2022
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
HOYA LENS THAILAND LTD (TH)
SAMUKAWA MASAHIKO (JP)
OKUURA KAZUTERU (JP)
International Classes:
B24B13/00; B24B9/14; B24B13/01; B24B55/02; B24D11/00; G02C7/02
Foreign References:
JP2003165045A2003-06-10
JPH1029148A1998-02-03
JPH07299720A1995-11-14
JP2012187703A2012-10-04
Attorney, Agent or Firm:
FUKUOKA Masahiro et al. (JP)
Download PDF:
View/Download PDF      PDF Help



 
Previous Patent: METHOD FOR CLEANING SILICON WAFER AND METHOD FOR PRODUCING SILICON WAFER

Next Patent: NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY